{"version":"1.0","provider_name":"Muegge","provider_url":"https:\/\/muegge-group.com\/en\/","author_name":"Steven Guggolz","author_url":"https:\/\/muegge-group.com\/en\/author\/stguggolz\/","title":"Photoresist Removal after High Dose Implant (HDIS) - Muegge","type":"rich","width":600,"height":338,"html":"<blockquote class=\"wp-embedded-content\" data-secret=\"zSGZ3ej5IL\"><a href=\"https:\/\/muegge-group.com\/en\/photoresist-removal-after-high-dose-implant-hdis\/\">Photoresist Removal after High Dose Implant (HDIS)<\/a><\/blockquote><iframe sandbox=\"allow-scripts\" security=\"restricted\" src=\"https:\/\/muegge-group.com\/en\/photoresist-removal-after-high-dose-implant-hdis\/embed\/#?secret=zSGZ3ej5IL\" width=\"600\" height=\"338\" title=\"&#8220;Photoresist Removal after High Dose Implant (HDIS)&#8221; &#8212; Muegge\" data-secret=\"zSGZ3ej5IL\" frameborder=\"0\" marginwidth=\"0\" marginheight=\"0\" scrolling=\"no\" class=\"wp-embedded-content\"><\/iframe><script type=\"text\/javascript\">\n\/* <![CDATA[ *\/\n\/*! This file is auto-generated *\/\n!function(d,l){\"use strict\";l.querySelector&&d.addEventListener&&\"undefined\"!=typeof URL&&(d.wp=d.wp||{},d.wp.receiveEmbedMessage||(d.wp.receiveEmbedMessage=function(e){var t=e.data;if((t||t.secret||t.message||t.value)&&!\/[^a-zA-Z0-9]\/.test(t.secret)){for(var s,r,n,a=l.querySelectorAll('iframe[data-secret=\"'+t.secret+'\"]'),o=l.querySelectorAll('blockquote[data-secret=\"'+t.secret+'\"]'),c=new RegExp(\"^https?:$\",\"i\"),i=0;i<o.length;i++)o[i].style.display=\"none\";for(i=0;i<a.length;i++)s=a[i],e.source===s.contentWindow&&(s.removeAttribute(\"style\"),\"height\"===t.message?(1e3<(r=parseInt(t.value,10))?r=1e3:~~r<200&&(r=200),s.height=r):\"link\"===t.message&&(r=new URL(s.getAttribute(\"src\")),n=new URL(t.value),c.test(n.protocol))&&n.host===r.host&&l.activeElement===s&&(d.top.location.href=t.value))}},d.addEventListener(\"message\",d.wp.receiveEmbedMessage,!1),l.addEventListener(\"DOMContentLoaded\",function(){for(var e,t,s=l.querySelectorAll(\"iframe.wp-embedded-content\"),r=0;r<s.length;r++)(t=(e=s[r]).getAttribute(\"data-secret\"))||(t=Math.random().toString(36).substring(2,12),e.src+=\"#?secret=\"+t,e.setAttribute(\"data-secret\",t)),e.contentWindow.postMessage({message:\"ready\",secret:t},\"*\")},!1)))}(window,document);\n\/\/# sourceURL=https:\/\/muegge-group.com\/wp-includes\/js\/wp-embed.min.js\n\/* ]]> *\/\n<\/script>\n","description":"High Dose Implant Strip (HDIS) \u2013 Challengeable process in semiconductor manufacturing Photoresist strip after high dose implant strip remains one of the most demanding processes insemiconductor industry. The challenge is to remove both the crust (or hardened layer formed during implant) and the soft bulk resist without burning the crust and therefore, without leaving carbonized [&hellip;]","thumbnail_url":"https:\/\/muegge.de\/wp-content\/uploads\/2019\/12\/muegge-blog-quality-leaps-in-micromachinery-and-mems-01.jpg"}