{"id":17733,"date":"2020-11-24T10:26:07","date_gmt":"2020-11-24T09:26:07","guid":{"rendered":"https:\/\/stage.muegge.de\/?p=17733"},"modified":"2020-12-02T15:05:51","modified_gmt":"2020-12-02T14:05:51","slug":"removal-of-black-carbon-and-organic-residues","status":"publish","type":"post","link":"https:\/\/muegge-group.com\/en\/removal-of-black-carbon-and-organic-residues\/","title":{"rendered":"Removal of Black Carbon and Organic Residues"},"content":{"rendered":"\t\t<div data-elementor-type=\"wp-post\" data-elementor-id=\"17733\" class=\"elementor elementor-17733\" data-elementor-post-type=\"post\">\n\t\t\t\t\t\t<section class=\"elementor-section elementor-top-section elementor-element elementor-element-e0f8acb elementor-section-boxed elementor-section-height-default elementor-section-height-default\" data-id=\"e0f8acb\" data-element_type=\"section\" data-e-type=\"section\">\n\t\t\t\t\t\t<div class=\"elementor-container elementor-column-gap-default\">\n\t\t\t\t\t<div class=\"elementor-column elementor-col-100 elementor-top-column elementor-element elementor-element-ead9d0b\" data-id=\"ead9d0b\" data-element_type=\"column\" data-e-type=\"column\">\n\t\t\t<div class=\"elementor-widget-wrap elementor-element-populated\">\n\t\t\t\t\t\t<div class=\"elementor-element elementor-element-5319fe8 elementor-widget__width-initial elementor-widget elementor-widget-heading\" data-id=\"5319fe8\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"heading.base\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t<h4 class=\"h5\">Rework and Removal of C-based Materials \u2013 <br \/n>\nA challenge not only for semiconductor manufacturer<\/h4>\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-fce7403 elementor-widget__width-initial elementor-widget elementor-widget-text-editor\" data-id=\"fce7403\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t<p>The deposition of carbon-based materials plays a major role in semiconductor industries. Lithography is not possible without the related photoresists. Residue free cleaning of C-based materials always was and will be challenging, even more with the industry moving towards advanced material, e.g., low-k materials, C-doped oxide, diamond like carbon (DLC), diamond. As the market of diamond deposition and laboratory grown diamond is constantly growing, it is critical to have the proper tool to clean off the residuel black carbon without damaging the diamond structure.<\/p>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t<section class=\"elementor-section elementor-top-section elementor-element elementor-element-8052f9e elementor-section-boxed elementor-section-height-default elementor-section-height-default\" data-id=\"8052f9e\" data-element_type=\"section\" data-e-type=\"section\">\n\t\t\t\t\t\t<div class=\"elementor-container elementor-column-gap-default\">\n\t\t\t\t\t<div class=\"elementor-column elementor-col-100 elementor-top-column elementor-element elementor-element-3e70ed6\" data-id=\"3e70ed6\" data-element_type=\"column\" data-e-type=\"column\">\n\t\t\t<div class=\"elementor-widget-wrap elementor-element-populated\">\n\t\t\t\t\t\t<div class=\"elementor-element elementor-element-2a35ca3 elementor-widget__width-initial elementor-widget elementor-widget-heading\" data-id=\"2a35ca3\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"heading.base\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t<h4 class=\"h5\">Microwave Plasma \u2013 Isotropic cleaning means soft and efficient cleaning<\/h4>\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-f47ca7c elementor-widget__width-initial elementor-widget elementor-widget-text-editor\" data-id=\"f47ca7c\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t<p>Due to its nature, the RF-plasma exposes the substrate to an energetic interaction with the plasma. Ions accelerating towards the substrate result in physical damage and contamination of the materials to be cleaned. in the removal of black carbon on diamond just a little amount of RF-bias may cause damage of the crystal structure and consequentially, irreversible discoloration. In contrast, microwave assisted plasma systems are capable to clean fast, efficient and with no impact to the substrate<sup>1<\/sup>.<\/p><p><br \/>Using MUEGGE\u2019s microwave assisted plasma systems, the energy transfer to the substrate is extremely low, no ions are released into the process chamber. As a result, the substrate remains untouched, the active cleaning mechanism is the chemical reaction with black carbon or other carbon based residues. As the reaction is purely isotropic, no direct exposure of the residues to the plasma is required, which makes it extremely favorable for any 3D structures like MEMS or MMS.<\/p><p>\u00a0<\/p><p><sup>1 <\/sup><em>Amorn THEDSAKHULWONG and Warawoot THOWLADDA. Journal of Metals, Materials and Minerals. Vol. 18 No. 2 pp. 137-141, 2008<\/em><\/p><p>\u00a0<\/p>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t<section class=\"elementor-section elementor-top-section elementor-element elementor-element-672f729 elementor-section-boxed elementor-section-height-default elementor-section-height-default\" data-id=\"672f729\" data-element_type=\"section\" data-e-type=\"section\">\n\t\t\t\t\t\t<div class=\"elementor-container elementor-column-gap-default\">\n\t\t\t\t\t<div class=\"elementor-column elementor-col-100 elementor-top-column elementor-element elementor-element-d98c0f6\" data-id=\"d98c0f6\" data-element_type=\"column\" data-e-type=\"column\">\n\t\t\t<div class=\"elementor-widget-wrap elementor-element-populated\">\n\t\t\t\t\t\t<div class=\"elementor-element elementor-element-3001044 elementor-widget__width-initial elementor-widget elementor-widget-heading\" data-id=\"3001044\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t<h4 class=\"elementor-heading-title elementor-size-default\">MUEGGE\u2019s solution \u2013 STP Product Family <br> <br>\n   <\/h4>\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<section class=\"elementor-section elementor-inner-section elementor-element elementor-element-58838d0 elementor-section-boxed elementor-section-height-default elementor-section-height-default\" data-id=\"58838d0\" data-element_type=\"section\" data-e-type=\"section\">\n\t\t\t\t\t\t<div class=\"elementor-container elementor-column-gap-default\">\n\t\t\t\t\t<div class=\"elementor-column elementor-col-50 elementor-inner-column elementor-element elementor-element-5ed67c6\" data-id=\"5ed67c6\" data-element_type=\"column\" data-e-type=\"column\">\n\t\t\t<div class=\"elementor-widget-wrap elementor-element-populated\">\n\t\t\t\t\t\t<div class=\"elementor-element elementor-element-a00c1c6 elementor-widget elementor-widget-image\" data-id=\"a00c1c6\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"image.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t\t\t\t<figure class=\"wp-caption\">\n\t\t\t\t\t\t\t\t\t\t\t<a href=\"https:\/\/muegge-group.com\/en\/product-category\/plasma-systems\/\" target=\"_blank\">\n\t\t\t\t\t\t\t<img fetchpriority=\"high\" decoding=\"async\" width=\"1024\" height=\"819\" src=\"https:\/\/muegge-group.com\/wp-content\/uploads\/2020\/11\/WP_MA3000D_Web_DSC00007-1024x819.jpg\" class=\"attachment-large size-large wp-image-17817\" alt=\"\" srcset=\"https:\/\/muegge-group.com\/wp-content\/uploads\/2020\/11\/WP_MA3000D_Web_DSC00007-1024x819.jpg 1024w, https:\/\/muegge-group.com\/wp-content\/uploads\/2020\/11\/WP_MA3000D_Web_DSC00007-600x480.jpg 600w, https:\/\/muegge-group.com\/wp-content\/uploads\/2020\/11\/WP_MA3000D_Web_DSC00007-300x240.jpg 300w, https:\/\/muegge-group.com\/wp-content\/uploads\/2020\/11\/WP_MA3000D_Web_DSC00007-768x614.jpg 768w, https:\/\/muegge-group.com\/wp-content\/uploads\/2020\/11\/WP_MA3000D_Web_DSC00007-1536x1229.jpg 1536w, https:\/\/muegge-group.com\/wp-content\/uploads\/2020\/11\/WP_MA3000D_Web_DSC00007-1440x1152.jpg 1440w, https:\/\/muegge-group.com\/wp-content\/uploads\/2020\/11\/WP_MA3000D_Web_DSC00007.jpg 2000w\" sizes=\"(max-width: 1024px) 100vw, 1024px\" \/>\t\t\t\t\t\t\t\t<\/a>\n\t\t\t\t\t\t\t\t\t\t\t<figcaption class=\"widget-image-caption wp-caption-text\">MUEGGE STP Tools<\/figcaption>\n\t\t\t\t\t\t\t\t\t\t<\/figure>\n\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t<div class=\"elementor-column elementor-col-50 elementor-inner-column elementor-element elementor-element-35ba2b9\" data-id=\"35ba2b9\" data-element_type=\"column\" data-e-type=\"column\">\n\t\t\t<div class=\"elementor-widget-wrap elementor-element-populated\">\n\t\t\t\t\t\t<div class=\"elementor-element elementor-element-06f0fd4 elementor-widget__width-initial elementor-widget elementor-widget-text-editor\" data-id=\"06f0fd4\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t<ul><li>Microwave assisted plasma efficiently uses the energy to form highly reactive, neutral particles called radicals. No ions being released into the process chamber, no damage nor contamination of the substrate is created. Therefore the MW-assisted remote plasma system is ideal for black carbon removal on diamonds or DLC. Visual aspect and physical properties of the substrate are preserved.<\/li><\/ul><p>\u00a0<\/p><ul><li>The radicals released from the MW assisted plasma guarantee smooth, pure chemical cleaning. As a consequence, the physical impact is extremely low and isotropic residue removal prevents further damage of the substrate material.<\/li><\/ul>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t<section class=\"elementor-section elementor-top-section elementor-element elementor-element-0bb9286 elementor-section-boxed elementor-section-height-default elementor-section-height-default\" data-id=\"0bb9286\" data-element_type=\"section\" data-e-type=\"section\">\n\t\t\t\t\t\t<div class=\"elementor-container elementor-column-gap-default\">\n\t\t\t\t\t<div class=\"elementor-column elementor-col-100 elementor-top-column elementor-element elementor-element-b6550de\" data-id=\"b6550de\" data-element_type=\"column\" data-e-type=\"column\">\n\t\t\t<div class=\"elementor-widget-wrap elementor-element-populated\">\n\t\t\t\t\t\t<div class=\"elementor-element elementor-element-5ee1b5c elementor-widget__width-initial elementor-widget elementor-widget-heading\" data-id=\"5ee1b5c\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"heading.base\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t<h4 class=\"h5\">Microwave assisted plasma for removal of C-based materials\n <\/h4>\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-9cdbad8 elementor-widget__width-initial elementor-widget elementor-widget-heading\" data-id=\"9cdbad8\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"heading.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t<h4 class=\"elementor-heading-title elementor-size-default\">   <\/h4>\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-368647a elementor-widget elementor-widget-image\" data-id=\"368647a\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"image.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t\t\t\t<figure class=\"wp-caption\">\n\t\t\t\t\t\t\t\t\t\t<img decoding=\"async\" src=\"https:\/\/muegge-group.com\/wp-content\/uploads\/elementor\/thumbs\/Figure-1-qidzlzafzos1ttvi76ww5njqdewkosi67g43k0hbuy.png\" title=\"Figure 1\" alt=\"Figure 1\" loading=\"lazy\" \/>\t\t\t\t\t\t\t\t\t\t\t<figcaption class=\"widget-image-caption wp-caption-text\">Figure 1: Temperature heating and cooling over time at a microwave power of PMW = 2000 W.<\/figcaption>\n\t\t\t\t\t\t\t\t\t\t<\/figure>\n\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-2806868 elementor-widget__width-initial elementor-widget elementor-widget-text-editor\" data-id=\"2806868\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t<p class=\"MsoNormal\">As shown in Figure 1, the radical-only formation results in little to no interaction with the substrate and the plasma chamber (low temperature), no ions in the chamber means contamination free processing. The pure chemical cleaning process can be fine-tuned without need to take physical etching into consideration.<\/p>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-c773876 elementor-widget__width-initial elementor-widget elementor-widget-heading\" data-id=\"c773876\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"heading.base\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t<h4 class=\"h5\">Advantages of microwave assisted plasma cleaning<\/h4>\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<div class=\"elementor-element elementor-element-99169e9 elementor-widget__width-initial elementor-widget elementor-widget-text-editor\" data-id=\"99169e9\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"text-editor.default\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t\t\t\t\t<p>Microwave-assisted plasma allows to remove carbon based residues as well as black carbon for semiconductor applications and diamond processing.<br \/>Due to the physical properties, MW assisted plasma is specially designed for fast but smooth etching without the typical ion-attack observed for RIE systems (RF-based plasma). The radicals generated in the plasma initiate the chemical reaction at the surface only. Without measurable electrical fields and ions present at substrate level, no ion-induced physical damage occurs. <br \/>MW assisted plasma is highly environmentally compliant due to highly efficient dissociation of process gases like CF<sub>4<\/sub> and NF<sub>3<\/sub>.<\/p>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t<section class=\"elementor-section elementor-top-section elementor-element elementor-element-5ade659 elementor-section-boxed elementor-section-height-default elementor-section-height-default\" data-id=\"5ade659\" data-element_type=\"section\" data-e-type=\"section\">\n\t\t\t\t\t\t<div class=\"elementor-container elementor-column-gap-default\">\n\t\t\t\t\t<div class=\"elementor-column elementor-col-100 elementor-top-column elementor-element elementor-element-034a5a5\" data-id=\"034a5a5\" data-element_type=\"column\" data-e-type=\"column\">\n\t\t\t<div class=\"elementor-widget-wrap elementor-element-populated\">\n\t\t\t\t\t\t<div class=\"elementor-element elementor-element-d7d614e elementor-widget elementor-widget-button\" data-id=\"d7d614e\" data-element_type=\"widget\" data-e-type=\"widget\" data-widget_type=\"button.base\">\n\t\t\t\t<div class=\"elementor-widget-container\">\n\t\t\t\t\t        <div class=\"elementor-button-wrapper\">\n            <a href=\"https:\/\/muegge-group.com\/en\/meet-muegge\/\" class=\"btn btn-primary-line\" role=\"button\">\n                        <span class=\"elementor-button-content-wrapper\">\n\t\t\t            <span class=\"elementor-button-text\">Meet Muegge<\/span>\n\t\t<\/span>\n                    <\/a>\n        <\/div>\n        \t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t<\/div>\n\t\t","protected":false},"excerpt":{"rendered":"<p>Rework and Removal of C-based Materials \u2013 A challenge not only for semiconductor manufacturer The deposition of carbon-based materials plays a major role in semiconductor industries. Lithography is not possible without the related photoresists. Residue free cleaning of C-based materials always was and will be challenging, even more with the industry moving towards advanced material, [&hellip;]<\/p>\n","protected":false},"author":4,"featured_media":0,"comment_status":"open","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"_acf_changed":false,"footnotes":""},"categories":[2170,765,766],"tags":[],"class_list":["post-17733","post","type-post","status-publish","format-standard","hentry","category-lab-grown-diamonds-en","category-mems-en","category-semi-conductor-en"],"acf":[],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v27.3 - https:\/\/yoast.com\/product\/yoast-seo-wordpress\/ -->\n<title>Removal of Black Carbon and Organic Residues - Muegge<\/title>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/muegge-group.com\/en\/removal-of-black-carbon-and-organic-residues\/\" \/>\n<meta property=\"og:locale\" content=\"en_GB\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Removal of Black Carbon and Organic Residues - Muegge\" \/>\n<meta property=\"og:description\" content=\"Rework and Removal of C-based Materials \u2013 A challenge not only for semiconductor manufacturer The deposition of carbon-based materials plays a major role in semiconductor industries. 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