{"id":14693,"date":"2020-06-17T08:30:26","date_gmt":"2020-06-17T06:30:26","guid":{"rendered":"https:\/\/stage.muegge.de\/les-micro-ondes-et-le-nettoyage-de-la-chambre-de-traitement\/"},"modified":"2020-11-24T16:47:16","modified_gmt":"2020-11-24T15:47:16","slug":"les-micro-ondes-et-le-nettoyage-de-la-chambre-de-traitement","status":"publish","type":"post","link":"https:\/\/muegge-group.com\/fr\/les-micro-ondes-et-le-nettoyage-de-la-chambre-de-traitement\/","title":{"rendered":"Les micro-ondes et le nettoyage de la chambre de traitement"},"content":{"rendered":"\t\t
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Nettoyage de la chambre apr\u00e8s le d\u00e9p\u00f4t de di\u00e9lectriques - Un cas pour le plasma micro-ondes isotrope<\/h4>\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t
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La proc\u00e9dure de d\u00e9p\u00f4t \u00e9tant l’un des piliers de la production de semi-conducteurs, elle d\u00e9pend d’un environnement contr\u00f4l\u00e9, reproductible et propre. Un d\u00e9fi de la proc\u00e9dure de d\u00e9p\u00f4t est la prevention du d\u00e9p\u00f4t sur les parois internes de la chambre de traitment. Il s’agit d’une menace permanente de particules et de contamination. Le nettoyage complet et r\u00e9p\u00e9table de la chambre de traitement est essentiel pour assurer la qualit\u00e9 des couches d\u00e9pos\u00e9es, car les dimensions critiques d\u00e9fient les limites physiques.<\/span><\/p>\n

\u00a0<\/p>\n

Le plasma micro-ondes est la solution parfaite pour retirer le rev\u00eatement \u00e9pais d\u00e9pos\u00e9 sur les parois de la chambre de traitement. L’avantage du plasma micro-ondes (MW) par rapport au plasma HF est que les parois de la chambre peuvent \u00eatre nettoy\u00e9es m\u00eame sans exposition directe \u00e0 la source de plasma MW.<\/span><\/p>\n\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t

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Plasma micro-ondes - Isotrope et nettoyage rapide<\/h4>\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t
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Due \u00e0 ses propri\u00e9t\u00e9s anisotropes, le plasma HF n’est pas id\u00e9al pour nettoyer la chambre de d\u00e9p\u00f4t. Le bombardement ionique est inh\u00e9rent au plasma HF et les pi\u00e8ces \u00e0 nettoyer n\u00e9cessitent une exposition directe au plasma. En r\u00e9alit\u00e9, il y a toujours des zones des parois qui sont cach\u00e9es \u00e0 la source plasma, ce qui entra\u00eene un nettoyage incomplet, l\u2019\u00e9caillage subs\u00e9quent, des particules r\u00e9siduelles et donc un faible rendement. Le nettoyage plasma micro-ondes est la solution \u00e0 ce probl\u00e8me. Les radicaux g\u00e9n\u00e9r\u00e9s atteignent les zones cach\u00e9es et prot\u00e9g\u00e9es de la chambre qui sont invisibles \u00e0 la source HF.<\/span><\/p>\n\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t

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Le Remote plasma micro-ondes de Muegge r\u00e9sout ces probl\u00e8mes<\/h4>\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t
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  • \n\t\t\t\t\t\t\t\t\t\t\t\n\t\t\t\t\t\t\t<\/i>\t\t\t\t\t\t<\/span>\n\t\t\t\t\t\t\t\t\t\tLes radicaux g\u00e9n\u00e9r\u00e9s dans le plasma micro-ondes atteignent les parois de la chambre et effectuent le nettoyage, m\u00eame s'il n'y a pas d'exposition directe au plasma. Fini le nettoyage incomplet, les radicaux atteignent chaque coin de votre chambre de traitement.<\/span>\n\t\t\t\t\t\t\t\t\t<\/li>\n\t\t\t\t\t\t\t\t
  • \n\t\t\t\t\t\t\t\t\t\t\t\n\t\t\t\t\t\t\t<\/i>\t\t\t\t\t\t<\/span>\n\t\t\t\t\t\t\t\t\t\tLe nettoyage des zones expos\u00e9es reste \u00e0 l'abri des attaques ult\u00e9rieures - contrairement au plasma HF o\u00f9 la pulv\u00e9risation peut alt\u00e9rer ou endommager les parois internes.<\/span>\n\t\t\t\t\t\t\t\t\t<\/li>\n\t\t\t\t\t\t\t\t
  • \n\t\t\t\t\t\t\t\t\t\t\t\n\t\t\t\t\t\t\t<\/i>\t\t\t\t\t\t<\/span>\n\t\t\t\t\t\t\t\t\t\tLa gravure peut \u00eatre effectu\u00e9e en toute s\u00e9curit\u00e9 due \u00e0 la nature chimique du nettoyage. Pas de bombardement ionique causant des dommages aux zones propres de la chambre et \u00e0 l'\u00e9quipement sensible (par exemple, le mandrin \u00e9lectrostatique).<\/span>\n\t\t\t\t\t\t\t\t\t<\/li>\n\t\t\t\t\t\t\t\t
  • \n\t\t\t\t\t\t\t\t\t\t\t\n\t\t\t\t\t\t\t<\/i>\t\t\t\t\t\t<\/span>\n\t\t\t\t\t\t\t\t\t\tLa solution de Muegge pour le nettoyage des chambres est durable et \u00e9conome en \u00e9nergie. Toute l'\u00e9nergie est transf\u00e9r\u00e9e dans la formation de radicaux, l'effet thermique reste tr\u00e8s faible.<\/span>\n\t\t\t\t\t\t\t\t\t<\/li>\n\t\t\t\t\t\t<\/ul>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t
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    Large gamme de proc\u00e9dures<\/h4>\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t
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    Le nettoyage avec le remote plasma de Muegge est disponible pour tous les mat\u00e9riaux ne n\u00e9cessitant pas de chimie corrosive, par exemple:<\/span><\/p>\n

    \u00a0<\/p>\n\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t

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    • \n\t\t\t\t\t\t\t\t\t\t\t\n\t\t\t\t\t\t\t<\/i>\t\t\t\t\t\t<\/span>\n\t\t\t\t\t\t\t\t\t\tOxyde de silicium<\/span>\n\t\t\t\t\t\t\t\t\t<\/li>\n\t\t\t\t\t\t\t\t
    • \n\t\t\t\t\t\t\t\t\t\t\t\n\t\t\t\t\t\t\t<\/i>\t\t\t\t\t\t<\/span>\n\t\t\t\t\t\t\t\t\t\tNitrure de silicium<\/span>\n\t\t\t\t\t\t\t\t\t<\/li>\n\t\t\t\t\t\t\t\t
    • \n\t\t\t\t\t\t\t\t\t\t\t\n\t\t\t\t\t\t\t<\/i>\t\t\t\t\t\t<\/span>\n\t\t\t\t\t\t\t\t\t\tMat\u00e9riaux \u00e0 faible k<\/span>\n\t\t\t\t\t\t\t\t\t<\/li>\n\t\t\t\t\t\t\t\t
    • \n\t\t\t\t\t\t\t\t\t\t\t\n\t\t\t\t\t\t\t<\/i>\t\t\t\t\t\t<\/span>\n\t\t\t\t\t\t\t\t\t\tMat\u00e9riaux organiques<\/span>\n\t\t\t\t\t\t\t\t\t<\/li>\n\t\t\t\t\t\t<\/ul>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t
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      Les avantages du proc\u00e9d\u00e9 plasma micro-ondes<\/h4>\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t
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      La fabrication de semi-conducteurs n\u00e9cessite des conditions r\u00e9p\u00e9tables et des chambres de traitement propres. Le plasma micro-ondes permet de nettoyer rapidement sans \u00e9roder les composants sensibles int\u00e9gr\u00e9s dans la chambre (par exemple, le mandrin \u00e9lectrostatique).<\/span><\/p>\n

      Le plasma micro-ondes offre la possibilit\u00e9 de retirer compl\u00e8tement les d\u00e9p\u00f4ts di\u00e9lectriques et les couches organiques \u00e0 haute vitesse (> 200um \/ h) et \u00e0 haute s\u00e9lectivit\u00e9 sans l\u2019alt\u00e9ration des surfaces internes. Les radicaux g\u00e9n\u00e9r\u00e9s produisent des r\u00e9actions chimiques en surface, conduisant \u00e0 une gravure chimique pure \u00e0 des vitesses \u00e9lev\u00e9es et avec un effet thermique extr\u00eamement faible.<\/span><\/p>\n

      Le proc\u00e9d\u00e9 est propice pour l\u2019environnement due \u00e0 la dissociation presque compl\u00e8te des mol\u00e9cules gazeuses utilis\u00e9es dans le process, par exemple CF4<\/sub>.<\/span><\/p>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t<\/div>\n\t\t","protected":false},"excerpt":{"rendered":"

      Nettoyage de la chambre apr\u00e8s le d\u00e9p\u00f4t de di\u00e9lectriques – Un cas pour le plasma micro-ondes isotrope La proc\u00e9dure de d\u00e9p\u00f4t \u00e9tant l’un des piliers de la production de semi-conducteurs, elle d\u00e9pend d’un environnement contr\u00f4l\u00e9, reproductible et propre. Un d\u00e9fi de la proc\u00e9dure de d\u00e9p\u00f4t est la prevention du d\u00e9p\u00f4t sur les parois internes de […]<\/p>\n","protected":false},"author":3,"featured_media":0,"comment_status":"open","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"_acf_changed":false,"footnotes":""},"categories":[4448],"tags":[],"class_list":["post-14693","post","type-post","status-publish","format-standard","hentry","category-semi-conducteurs"],"acf":[],"yoast_head":"\nLes micro-ondes et le nettoyage de la chambre de traitement - Muegge<\/title>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/muegge-group.com\/fr\/les-micro-ondes-et-le-nettoyage-de-la-chambre-de-traitement\/\" \/>\n<meta property=\"og:locale\" content=\"fr_FR\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Les micro-ondes et le nettoyage de la chambre de traitement - Muegge\" \/>\n<meta property=\"og:description\" content=\"Nettoyage de la chambre apr\u00e8s le d\u00e9p\u00f4t de di\u00e9lectriques – Un cas pour le plasma micro-ondes isotrope La proc\u00e9dure de d\u00e9p\u00f4t \u00e9tant l’un des piliers de la production de semi-conducteurs, elle d\u00e9pend d’un environnement contr\u00f4l\u00e9, reproductible et propre. 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