{"version":"1.0","provider_name":"Muegge","provider_url":"https:\/\/muegge-group.com\/ko\/","author_name":"Steven Guggolz","author_url":"https:\/\/muegge-group.com\/ko\/author\/stguggolz\/","title":"Endpoint Control for Thick Photoresist Removal - Muegge","type":"rich","width":600,"height":338,"html":"<blockquote class=\"wp-embedded-content\" data-secret=\"BQ6PM4Jkgd\"><a href=\"https:\/\/muegge-group.com\/ko\/endpoint-control-for-thick-photoresist-removal\/\">Endpoint Control for Thick Photoresist Removal<\/a><\/blockquote><iframe sandbox=\"allow-scripts\" security=\"restricted\" src=\"https:\/\/muegge-group.com\/ko\/endpoint-control-for-thick-photoresist-removal\/embed\/#?secret=BQ6PM4Jkgd\" width=\"600\" height=\"338\" title=\"&#8220;Endpoint Control for Thick Photoresist Removal&#8221; &#8212; Muegge\" data-secret=\"BQ6PM4Jkgd\" frameborder=\"0\" marginwidth=\"0\" marginheight=\"0\" scrolling=\"no\" class=\"wp-embedded-content\"><\/iframe><script type=\"text\/javascript\">\n\/* <![CDATA[ *\/\n\/*! This file is auto-generated *\/\n!function(d,l){\"use strict\";l.querySelector&&d.addEventListener&&\"undefined\"!=typeof URL&&(d.wp=d.wp||{},d.wp.receiveEmbedMessage||(d.wp.receiveEmbedMessage=function(e){var t=e.data;if((t||t.secret||t.message||t.value)&&!\/[^a-zA-Z0-9]\/.test(t.secret)){for(var s,r,n,a=l.querySelectorAll('iframe[data-secret=\"'+t.secret+'\"]'),o=l.querySelectorAll('blockquote[data-secret=\"'+t.secret+'\"]'),c=new RegExp(\"^https?:$\",\"i\"),i=0;i<o.length;i++)o[i].style.display=\"none\";for(i=0;i<a.length;i++)s=a[i],e.source===s.contentWindow&&(s.removeAttribute(\"style\"),\"height\"===t.message?(1e3<(r=parseInt(t.value,10))?r=1e3:~~r<200&&(r=200),s.height=r):\"link\"===t.message&&(r=new URL(s.getAttribute(\"src\")),n=new URL(t.value),c.test(n.protocol))&&n.host===r.host&&l.activeElement===s&&(d.top.location.href=t.value))}},d.addEventListener(\"message\",d.wp.receiveEmbedMessage,!1),l.addEventListener(\"DOMContentLoaded\",function(){for(var e,t,s=l.querySelectorAll(\"iframe.wp-embedded-content\"),r=0;r<s.length;r++)(t=(e=s[r]).getAttribute(\"data-secret\"))||(t=Math.random().toString(36).substring(2,12),e.src+=\"#?secret=\"+t,e.setAttribute(\"data-secret\",t)),e.contentWindow.postMessage({message:\"ready\",secret:t},\"*\")},!1)))}(window,document);\n\/\/# sourceURL=https:\/\/muegge-group.com\/wp-includes\/js\/wp-embed.min.js\n\/* ]]> *\/\n<\/script>\n","description":"Complete removal of thick photoresist needs proper endpoint detection Applying microwave (MW) plasma to remove thick resist such as used for micro-machinery and microelectromechanical systems (MEMS) requires adequate endpoint detection to limit the unnecessary exposure of sensitive structures and surfaces to reactive gases. The unique properties of microwave assisted plasma allow easy and accurate endpoint [&hellip;]","thumbnail_url":"https:\/\/muegge.de\/wp-content\/uploads\/2019\/12\/muegge-blog-endpoint-control-for-thick-photoresist-removal-01.jpg"}